《植物生理学报》 2016, 52(7): 1019-1027

硅/砷比对水稻剑叶和根系中砷亚细胞分布的影响

孙宇¹, 张敏¹, 薛培英^1,2, 郑坤¹, 王建广¹, 刘文菊^1,2,*

¹河北农业大学资源与环境科学学院, 河北保定071000; ²河北省农田生态环境重点实验室, 河北保定071000

通信作者：刘文菊；E-mail: liuwj@hebau.edu.cn

摘　要：

以水稻品种‘Italica carolina’为试验材料, 分别生长在含有As^III和As^V介质中3 d, 采用营养液培养方法和亚细胞组分分级技术, 研究了不同硅/砷比对水稻剑叶和根中砷亚细胞分布特征的影响。结果显示, 水稻无论生长在As^III或As^V条件下, 根系和剑叶亚细胞不同组分中砷含量顺序为: 胞液>细胞壁>细胞器。从水稻根中砷的亚细胞分布来看, As^III培养条件下加硅明显降低了根系砷在亚细胞组分中的分布, 且硅/砷比10:1时根细胞器和胞液中砷的含量最低; 而在As^V培养条件下, 仅硅/砷比200:1处理显著降低了根系胞液组分中的砷含量(P<0.05)。从水稻剑叶中砷的亚细胞分布来看, As^III培养条件下硅/砷比10:1显著降低了胞液和细胞壁中的砷含量(P<0.05)且达到了最低值, 而细胞器中砷含量在硅/砷比1:1时达到最低; As^V培养条件下, 不同硅/砷比并没有明显影响砷在剑叶中的亚细胞分布。

关键词：水稻; 砷; 亚细胞分布; 硅/砷比

收稿：2016-03-21   修定：2016-05-30

资助：国家自然科学基金(41471398)和河北省高等学校创新团队领军人才培育计划(LJRC016)。 * 通讯作者(E-mail: liuwj@hebau.edu.cn)。

Subcellular distribution of arsenic in flag leaf and root of rice with different ratios of silicon to arsenic

SUN Yu¹, ZHANG Min¹, XUE Pei-Ying^1,2, ZHENG Kun¹, WANG Jian-Guang¹, LIU Wen-Ju^1,2,*

¹College of Resources and Environment Science, Agricultural University of Hebei, Baoding, Hebei 071000, China; ²Key Laboratory for Farmland Eco-Environment of Hebei Province, Baoding, Hebei 071000, China

Corresponding author: LIU Wen-Ju; E-mail: liuwj@hebau.edu.cn

Abstract:

A hydroponic experiment was conducted to investigate subcellular distribution of arsenic (As) in flag leaf and root of rice (‘Italica carolina’) exposed to As^III and As^V solutions with different ratios of silicon (Si) to arsenic for 3 days. Results showed that regardless of whether As^III or As^V was supplied to rice, As concentrations in different fractions of root and flag leaf followed the same pattern: cytoplasmic supernatant>cell wall>organelle. When supplied with As^III, As concentrations in subcellular fractions of roots were significantly decreased by Si addition, with lowest concentrations of As in cytoplasmic supernatant and organelle fractions of roots with Si/As at 10:1. Whereas, when suppllied with As^V, only at Si/As 200:1 dramatically reduced the As concentration in cytoplasmic supernatant of root (P<0.05). For the subcellular distribution of arsenic in rice flag leaves, when supplied with As^III, the As concentrations in cytoplasmic supernatant and cell wall reduced significantly with Si/As at 10:1 (P<0.05) and reached the minimum level, while lowest As concentration in organelle parts of leaves were found at Si/As 1:1. However, there was no significant effect on subcellular distribution of arsenic in flag leaves when As^V supplied in the nutrient solution.

Key words: rice; arsenic; subcellular distribution; ratio of silicon to arsenic